Jonathan Cobb

Synopsys (United States) — United States

Engineering · Physical Sciences

10h-index407citations51works0.02yr avg
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Research Topics

Advancements in Photolithography Techniques(41), Integrated Circuits and Semiconductor Failure Analysis(21), Electron and X-Ray Spectroscopy Techniques(14), Semiconductor materials and devices(13), Copper Interconnects and Reliability(6)

Publications51 total

A Synopsys TCAD-based workflow to support technology evaluation at 3nm and beyond
2023
Materials Impact on SRAM Timing: An Ab Initio Study of Interconnects
2021
Ab initio for design-technology co-optimization
2021· 5 cited
Grain boundary scattering in Ru and Cu interconnects
2020· 7 cited
DTCO acceleration to fight scaling stagnation
2020· 9 cited
EXTH-48. ORAL GALLIUM MALTOLATE IMPAIRS TUMOR GROWTH AND EXTENDS DISEASE-SPECIFIC SURVIVAL IN A XENOGRAFT MODEL OF RECURRENT GBM
Neuro-Oncology·2018Open Access
Investigation of EUV tapeout flow issues, requirements, and options for volume manufacturing
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2011· 3 cited
EUV modeling accuracy and integration requirements for the 16nm node
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2010· 6 cited
Entry strategy of Southwest Airlines
2009Open Access
32nm design rule and process exploration flow
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2008· 8 cited
Patterning control budgets for the 32-nm generation incorporating lithography, design, and RET variations
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2007· 3 cited
OPC in memory-device patterns using boundary layer model for 3-dimensional mask topographic effect
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2007· 5 cited
Properties of infinite-layer and T′-phase electron-doped copper-oxide superconductors
Lecture notes in physics·2007
OPC to account for thick mask effect using simplified boundary layer model
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2006· 2 cited
High transmission mask technology for 45nm node imaging
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2006
High-transmission mask technology for 45nm node imaging
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2006
Tunable transmission phase mask options for 65/45nm node gate and contact processing
Optical Microlithography XVIII·2005· 2 cited
High transmission mask technology for 45nm node imaging
Optical Microlithography XVIII·2005· 4 cited
The impact of mask topography on CD control
Optical Microlithography XVIII·2005· 1 cited
Applications of CPL mask technology for sub-65nm gate imaging
Optical Microlithography XVIII·2005· 4 cited
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Frequent Co-authors

Kevin Lucas(12), Scott D. Hector(10), Colita Parker(9), Richard D. Peters(9), Will Conley(6), Craig C. Henderson(5), Uzodinma Okoroanyanwu(5), Donna J. O’Connell(5), Wei Wu(5), Bryan S. Kasprowicz(5), Lloyd C. Litt(5), Robert L. Brainard(4), Veena Rao(4), S. Dakshina-Murthy(4), Marc Cangemi(4), Rand Cottle(4), Young-Mog Ham(4), Bernie Roman(4), Frances A. Houle(3), Gregg M. Gallatin(3)