Richard D. Peters

Engineering · Physical Sciences

17h-index1.6kcitations82works0.02yr avg
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Research Topics

Advancements in Photolithography Techniques(18), Recycling and utilization of industrial and municipal waste in materials production(13), Integrated Circuits and Semiconductor Failure Analysis(12), Block Copolymer Self-Assembly(10), Nuclear materials and radiation effects(7)

Publications81 total

3D product configurator
2020
Characterisation of exposure and effects of silver nanoparticles to the earthworm Lumbricus rubellus
Socio-Environmental Systems Modeling·2012Open Access
Sterilization affects soil organic matter chemistry and bioaccumulation of spiked p,p′-DDE and anthracene by earthworms
Environmental Pollution·2010· 28 cited
Effects of Incubation Time and Organism Density on the Bioaccumulation of Soil-Borne p,p′-DDE by the Earthworm, Eisenia fetida
Bulletin of Environmental Contamination and Toxicology·2008· 4 cited
Environmental Assessment: The Development of a Borrow Source Cape Canaveral Air Force Station to Provide Material for Future Emergency Renourishment Projects Patrick Air Force Base
2007
Surfactants Differentially Impact <i>p,p</i>‘-DDE Accumulation by Plant and Earthworm Species
Environmental Science & Technology·2007· 33 cited
Differences in p,p′-DDE bioaccumulation from compost and soil by the plants Cucurbita pepo and Cucurbita maxima and the earthworms Eisenia fetida and Lumbricus terrestris
Environmental Pollution·2007· 33 cited
Gate etch process model for static random access memory bit cell and FinFET construction
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena·2006· 8 cited
Gas-phase fluorination of resist for improving line-end pullback during etch
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2006
Improved ion implantation masking through photoresist fluorination
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2006· 1 cited
DEVELOPMENT OF PROCESS TO MANUFACTURE GLASS/GLASS-CERAMIC PRODUCTS FROM PHOSPHOGYPSUM FINAL REPORT
2006· 3 cited
Reduction of line edge roughness and post resist trim pattern collapse for sub 60 nm gate patterns using gas-phase resist fluorination
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2005· 6 cited
A novel contact hole shrink process for the 65-nm-node and beyond
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2005· 6 cited
CPL reticle technology for advanced device applications
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2004
The application of CPL reticle technology for the 0.045-mm node
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2004· 1 cited
Process latitude measurements and their implications for CD control in EUV lithography
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2004· 1 cited
Single-layer and bilayer resist processes for EUV-type integrations
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2004· 2 cited
Ultra-Thin Resists for Advanced Lithography
Journal of Photopolymer Science and Technology·2004· 2 citedOpen Access
Critical dimension control in optical lithography
Microelectronic Engineering·2003· 20 cited
Fabrication of integrated circuits with high yield using ultra-thin resist processes
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2003· 2 cited
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Frequent Co-authors

Paul F. Nealey(11), Xiao Yang(9), Jonathan Cobb(9), Colita Parker(7), Tae Kyoung Kim(5), Jason W. Kelsey(4), Scott D. Hector(4), Sergei V. Postnikov(3), W.L. Kuhn(3), S. Dakshina-Murthy(3), E. Luckowski(3), T. Stephens(3), Juan Pablo(2), Byeong‐Hyeok Sohn(2), Jason C. White(2), Ilya B. Slizovskiy(2), S.C. Slate(2), César M. Garza(2), Shahid Rauf(2), Arturo M. Martinez(2)