Huiman Kang

Seoul National University — South Korea

Materials Science · Physical Sciences

19h-index3.1kcitations50works0.02yr avg
OpenAlex↗Google Scholar↗Lab page↗

Accepting Students?

No reports yet. Know if this professor is taking students?

Research Topics

Block Copolymer Self-Assembly(41), Advanced Polymer Synthesis and Characterization(16), Fluid Dynamics and Thin Films(14), Machine Learning in Materials Science(10), Polymer Surface Interaction Studies(8)

Publications50 total

0788 Molecular mechanisms of bovine intramuscular fat deposition
Journal of Animal Science·2016
Chemical Patterns for Directed Self-Assembly of Lamellae-Forming Block Copolymers with Density Multiplication of Features
Macromolecules·2013· 223 cited
Assembly of block copolymer films between chemically patterned and chemically homogeneous surface
Bulletin of the American Physical Society·2012
Degree of Perfection and Pattern Uniformity in the Directed Assembly of Cylinder-Forming Block Copolymer on Chemically Patterned Surfaces
Macromolecules·2011· 26 cited
Orientation Change of Diblock Copolymer Thin Films by the Addition of Amphiphilic Surfactants: Effect of Film Thickness and Surfactant Concentration
Macromolecules·2011· 8 cited
Pattern Dimensions and Feature Shapes of Ternary Blends of Block Copolymer and Low Molecular Weight Homopolymers Directed To Assemble on Chemically Nanopatterned Surfaces
ACS Nano·2011· 36 cited
Shape control and density multiplication of cylinder-forming ternary block copolymer-homopolymer blend thin films on chemical patterns
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena·2010· 7 citedOpen Access
Practical implementation of order parameter calculation for directed assembly of block copolymer thin films
Journal of Polymer Science Part B Polymer Physics·2010· 14 cited
Graphoepitaxial Assembly of Symmetric Block Copolymers on Weakly Preferential Substrates
Advanced Materials·2010· 91 cited
Thickness Dependence of Neutral Parameter Windows for Perpendicularly Oriented Block Copolymer Thin Films
Macromolecules·2010· 65 cited
Enhancing commensurability using cylinder-forming block copolymer-homopolymer ternary blends on spotted chemical patterns
Bulletin of the American Physical Society·2010
Remediation of Line Edge Roughness in Chemical Nanopatterns by the Directed Assembly of Overlying Block Copolymer Films
Macromolecules·2010· 90 cited
Directed Assembly of Cylinder-Forming Ternary Blend of Block Copolymer and Their Respective Homopolymers on Chemical Patterns with Density Multiplication of Features
Journal of Photopolymer Science and Technology·2010· 3 citedOpen Access
Cross-sectional Imaging of Block Copolymer Thin Films on Chemically Patterned Surfaces
Journal of Photopolymer Science and Technology·2010· 15 citedOpen Access
Placement Control of Nanomaterial Arrays on the Surface-Reconstructed Block Copolymer Thin Films
ACS Nano·2009· 92 cited
Orientation of Block Copolymer Resists on Interlayer Dielectrics with Tunable Surface Energy
Macromolecules·2009· 50 cited
Control of the critical dimensions and line edge roughness with pre-organized block copolymer pixelated photoresists
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena·2009· 5 cited
Synthesis of Photoacid Generator-Containing Patternable Diblock Copolymers by Reversible Addition−Fragmentation Transfer Polymerization
Chemistry of Materials·2009· 14 cited
Placement Control of Nanomaterial Arrays on Surface-Reconstructed Block Copolymer Thin Films
Figshare·2009Open Access
Neutral Parameter Window for Perpendicularly Oriented Block Copolymer Resists Deposited on Organosilicate Substrates with Tunable Surface Energy
Bulletin of the American Physical Society·2009
page 1 of 3Next →

Frequent Co-authors

Paul F. Nealey(36), Kookheon Char(23), Juan Pablo(14), Seung‐Heon Lee(9), Gordon S. W. Craig(8), François Detcheverry(7), Padma Gopalan(7), Jeong Gon Son(7), Mark P. Stoykovich(6), Kostas Ch. Daoulas(6), Marcus Müller(6), Chi‐Chun Liu(5), Eungnak Han(4), Yasuhiko Tada(3), Hiroshi Yoshida(3), Karl O. Stuen(3), Andrew N. Mangham(3), Robert J. Hamers(3), Hyo Seon Suh(3), Bumjoon J. Kim(3)