Eungnak Han

UNSW Sydney — Australia

Materials Science · Physical Sciences

17h-index1.9kcitations28works3.02yr avg
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Research Topics

Block Copolymer Self-Assembly(21), Advanced Polymer Synthesis and Characterization(10), Polymer Surface Interaction Studies(9), Advancements in Photolithography Techniques(6), Nanofabrication and Lithography Techniques(5)

Publications28 total

Enhancing the Electrocatalytic Oxidation of 5-Hydroxymethylfurfural (HMF) via Metallic Cobalt in Au–Co Nanoparticles
The Journal of Physical Chemistry C·2025· 2 citedOpen Access
Growth Mechanism of Seed-Mediated, Hexagonal Prism Copper Phosphide Nanoparticles
Crystal Growth & Design·2024· 1 citedOpen Access
DSA materials and processes development for ≤ P24 EUV resist L/S pattern rectification
2024· 6 cited
Material readiness for generation 2 directed self-assembly (DSA) < 24nm pitch
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2015
Extending resolution limits of EUV resist materials
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2015· 16 cited
A facile route for fabricating graphene nanoribbon array transistors using graphoepitaxy of a symmetric block copolymer
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2015· 7 cited
A Dual Functional Layer for Block Copolymer Self-Assembly and the Growth of Nanopatterned Polymer Brushes
Langmuir·2013· 26 cited
Bulk and Thin Film Morphological Behavior of Broad Dispersity Poly(styrene-<i>b-</i>methyl methacrylate) Diblock Copolymers
Macromolecules·2013· 45 cited
Chemical Patterns for Directed Self-Assembly of Lamellae-Forming Block Copolymers with Density Multiplication of Features
Macromolecules·2013· 223 cited
Interplay of surface chemical composition and film thickness on graphoepitaxial assembly of asymmetric block copolymers
Soft Matter·2013· 25 cited
Electronic Transport and Raman Scattering in Size-Controlled Nanoperforated Graphene
ACS Nano·2012· 52 cited
Chemical Patterns from Surface Grafted Resists for Directed Assembly of Block Copolymers
ACS Nano·2012· 18 cited
Degree of Perfection and Pattern Uniformity in the Directed Assembly of Cylinder-Forming Block Copolymer on Chemically Patterned Surfaces
Macromolecules·2011· 26 cited
Fabrication of Lithographically Defined Chemically Patterned Polymer Brushes and Mats
Macromolecules·2011· 198 cited
Organic Thin-films for Block Copolymer Lithography
2011
Integration of block copolymer directed assembly with 193 immersion lithography
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena·2010· 62 cited
Resist Free Patterning of Nonpreferential Buffer Layers for Block Copolymer Lithography
ACS Nano·2010· 34 cited
Graphoepitaxial Assembly of Symmetric Block Copolymers on Weakly Preferential Substrates
Advanced Materials·2010· 91 cited
Fabrication and Characterization of Large-Area, Semiconducting Nanoperforated Graphene Materials
Nano Letters·2010· 332 cited
Cross-Linked Random Copolymer Mats As Ultrathin Nonpreferential Layers for Block Copolymer Self-Assembly
Langmuir·2009· 58 cited
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Frequent Co-authors

Padma Gopalan(21), Paul F. Nealey(12), Myungwoong Kim(8), Chi‐Chun Liu(5), Karl O. Stuen(4), Huiman Kang(4), Nathaniel S. Safron(3), Michael S. Arnold(3), Melvina Leolukman(3), Young‐Hye La(2), Gordon S. W. Craig(2), Shengxiang Ji(2), Insik In(2), Daniel P. Sweat(2), Jonathan W. Choi(2), Florian Gstrein(2), Zeno Rizqi Ramadhan(2), Soshan Cheong(2), J. Justin Gooding(2), Richard D. Tilley(2)