Chuen Huei Yang

United Microelectronics (Taiwan) — Taiwan

Engineering · Physical Sciences

1h-index9citations12works0.02yr avg
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Research Topics

Advancements in Photolithography Techniques(11), Integrated Circuits and Semiconductor Failure Analysis(4), VLSI and Analog Circuit Testing(3), 3D IC and TSV technologies(3), Electron and X-Ray Spectroscopy Techniques(3)

Publications12 total

Strategy optimization for mask rule check in wafer fab
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2015· 2 cited
Mission Reliability Simulation and Verification of Electrification System of Conventional Submarines
Advanced materials research·2012· 1 cited
Implementing a framework to generate a unified OPC database from different EDA vendors for 45nm and beyond
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2009
Implementing a framework to generate a unified OPC from different EDA vendors for 45nm node and beyond
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2008
The calibration of process window model for 55-nm node
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2007· 1 cited
Feasibility study of splitting pitch technology on 45nm contact patterning with 0.93 NA
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2007
Feasibility study of 45nm metal patterning with 0.93 NA
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2007· 1 cited
SEM based data extraction for model calibration
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2007· 1 cited
A systematic approach for capturing interconnects hot spots
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2007· 1 cited
The investigation of 193nm CPL 3D topology mask effect on wafer process performance
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2006· 1 cited
Improvement of OPC accuracy for 65nm node contact using KIF
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2006· 1 cited
Inspection of integrated circuit database through reticle and wafer simulation: the lithography process window performance monitoring
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2005

Frequent Co-authors

Te Wu(6), Chia Wei Huang(5), Pei Ru Tsai(5), Yung Feng Cheng(4), Yueh Lin Chou(4), Jochen Schacht(4), Sheng Yuan Huang(2), Mohamed Al-Imam(2), Hanxi Liao(2), Mohamed Al-Iman(2), Rami Fathy(2), Nader Hindawy(2), Regina Shen(2), Shaina Lin(1), Roger Lin(1), Alice Wang(1), Rachel Lee(1), Erwin Deng(1), Irene Su(1), Brad Falch(1)