Young-Bum Koh

Samsung (South Korea) — South Korea

Engineering · Physical Sciences

6h-index104citations33works0.02yr avg
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Research Topics

Advancements in Photolithography Techniques(25), Optical Coatings and Gratings(10), Integrated Circuits and Semiconductor Failure Analysis(8), Surface Roughness and Optical Measurements(7), Advanced optical system design(5)

Publications33 total

A New Post-Treatment for Chemical-Mechanical Polishing Process of Very Large-Scale Integrated Circuit Tungsten Vias
Japanese Journal of Applied Physics·1998· 2 cited
Simulation and fabrication of attenuated phase-shifting masks: CrF_x
Applied Optics·1997· 11 cited
Stability of CrFx films for phase-shifting mask
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·1997· 3 cited
Fluorinated silicon nitride film for the bottom antireflective layer in quarter micron optical lithography
Semiconductor Science and Technology·1997· 3 cited
Single-layer halftone phase-shifting masks for DUV microlithography: optical property simulation and chromium compound film preparation
Applied Surface Science·1997· 5 cited
Titanium oxide film for the bottom antireflective layer in deep ultraviolet lithography
Applied Optics·1997· 13 cited
Effects of gas ring position and mesh introduction on film quality and thickness uniformity
Materials Science and Engineering B·1997· 10 cited
<title>Application of alternating phase-shifting masks to 200-nm contact holes</title>
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·1996
Optical property simulation of single-layer halftone phaseshifting masks for DUV microlithography
Semiconductor Science and Technology·1996· 7 cited
Investigation on application of chromium-based materials to attenuated phase-shift masks for DUV exposure
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·1996· 5 cited
Fabrication of dense contact patterns using halftone phase-shifting mask with off-axis illumination
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·1996
Design and properties of new deep-UV positive photoresist
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·1996· 1 cited
<title>Application of alternating phase-shifting masks to sub-quarter-micrometer contact holes</title>
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·1996· 1 cited
<title>Optical proximity correction of bit line pattern in DRAM devices</title>
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·1996· 1 cited
<title>Swing curve characteristics of halftone PSM with off-axis illumination for i-line lithography</title>
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·1996
<title>Improved overlay measurement of CMP processed layers</title>
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·1996· 3 cited
<title>Improved overlay reading on MLR structures</title>
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·1996
<title>Shifter slope variation effect of embedded half-tone phase-shift masks</title>
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·1995
<title>Side-lobe suppression in halftone PSM with optical proximity correction</title>
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·1995· 1 cited
Dependency of side-lobe effect of half-tone phase-shift mask on substrate material and topology and its solutions
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·1995
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Frequent Co-authors

Woo-Sung Han(16), Hoyoung Kang(13), Sang-Gyun Woo(11), Moonyong Lee(11), Sung‐Chul Lim(10), Zhong‐Tao Jiang(8), Kwangsoo No(8), Byeong‐Soo Bae(6), Seungbum Hong(6), Chang-Jin Sohn(6), Eunah Kim(4), Sang-Gyun Woo(3), Choon-Geun Park(3), Yong-Beom Kim(3), Jongwook Kye(3), Byung‐Hyuk Jun(2), Sang‐Soo Han(2), Kyong-Sub Kim(2), Joon Sung Lee(2), Junichi Yanagisawa(2)