O. Nalamasu

Applied Materials (United States) — United States

Engineering · Physical Sciences

13h-index1.1kcitations35works0.02yr avg
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Research Topics

Advancements in Photolithography Techniques(20), Nanofabrication and Lithography Techniques(11), Photonic and Optical Devices(9), Optical Coatings and Gratings(6), Semiconductor materials and devices(4)

Publications35 total

Technology/circuits joint evening panel discussion semiconductor industry in 2020: Evolution or revolution?
2015
Novel photocurable epoxy siloxane polymers for photolithography and imprint lithography applications
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena·2008· 19 cited
Submicrometer Dimple Array Based Interference Color Field Displays and Sensors
Nano Letters·2006· 13 cited
Method for sensing the self-assembly of polyelectrolyte monolayers using scanning probe microscope cantilever
Applied Physics Letters·2006· 7 cited
Lithography for sub<30 nm design rules: materials challenges
2004
Monolithic MEMS optical switch with amplified out-of-plane angular motion
IEEE/LEOS International Conference on Optical MEMS·2003· 24 cited
Low-cost, low-loss microlens arrays fabricated by soft-lithography replication process
Applied Physics Letters·2003· 150 cited
Buried ultra-low-energy gate implants for sub-0.25 micron CMOS technology
2002· 1 cited
Extending resolution limits of IC fabrication technology: demonstration by device fabrication and circuit performance
2002
Phase shift lithography in the manufacture of sub-120 nm low-voltage DSP circuits
2002· 1 cited
High-dynamic range channelized MEMS equalizing filter
2002· 24 cited
Linewidth reduction using liquid ashing for sub-100 nm critical dimensions with 248 nm lithography
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena·2001· 2 cited
Writing an arbitrary non-periodic pattern using interference lithography
Journal of Modern Optics·2001· 6 cited
Invited Paper: Extending Resolution Limits of IC Fabrication Technology: Demonstration by Device Fabrication and Circuit Performance
International Conference on VLSI Design·2001
Implementing advanced lithography technology: A 100 MHz, 1 V digital signal processor fabricated with phase shifted gates
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena·2000· 1 cited
Shape engineering: A novel optical proximity correction technique for attenuated phase-shift mask
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena·2000
A 2 million transistor digital processor with 120 nm gates fabricated by 248 nm wavelength phase shift technology
Microelectronic Engineering·2000
Overview of the STORM program application to 193nm singe layer resists
Microelectronic Engineering·2000· 4 cited
Probing the limits of optical lithography: The fabrication of sub-100nm devices with 193nm wavelength lithography
Microelectronic Engineering·2000· 1 cited
Sub-wavelength printing using multiple overlapping masks
Microelectronic Engineering·2000· 2 cited
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Frequent Co-authors

Allen G. Timko(17), G. P. Watson(13), F. Klemens(10), R. Cirelli(8), Raymond A. Cirelli(8), J. Frackoviak(8), W Mansfield(6), I.C. Kizilyalli(6), Ananth Dodabalapur(5), F. M. Houlihan(5), Allen H. Gabor(5), Stanley Pau(5), R.A. Kohler(5), Francis M. Houlihan(4), Richard S. Hutton(4), Elsa Reichmanis(4), H. Vaidya(4), K. Bolan(4), J. Bude(4), R. E. Slusher(3)