F.H.P.M. Habraken

Utrecht University — Netherlands

Engineering · Physical Sciences

38h-index5.0kcitations185works0.02yr avg
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Research Topics

Semiconductor materials and devices(97), Ion-surface interactions and analysis(54), Thin-Film Transistor Technologies(41), Electron and X-Ray Spectroscopy Techniques(35), Metal and Thin Film Mechanics(32)

Publications185 total

Anisotropic deformation of NiO nanoparticles embedded in silica under swift heavy ion irradiation
Nanotechnology·2019· 7 citedOpen Access
Shaping of Au nanoparticles embedded in various layered structures by swift heavy ion beam irradiation
Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms·2016· 7 cited
Morphological evolution of pulsed laser deposited ZrO2 thin films
Journal of Applied Physics·2010· 34 citedOpen Access
Ion beam shaping of Au nanoparticles in silica: Particle size and concentration dependence
Journal of Applied Physics·2009· 56 cited
On the argon and oxygen incorporation into SiOx through ion implantation during reactive plasma magnetron sputter deposition
Applied Surface Science·2008· 7 citedOpen Access
Distinct processes in radio-frequency reactive magnetron plasma sputter deposition of silicon suboxide films
Journal of Applied Physics·2007· 13 citedOpen Access
On the ion and neutral atom bombardment of the growth surface in magnetron plasma sputter deposition
Applied Physics Letters·2007· 33 cited
One-dimensional analysis of the rate of plasma-assisted sputter deposition
Journal of Applied Physics·2007· 39 cited
Characterization of a low-pressure argon plasma using optical emission spectroscopy and a global model
Journal of Applied Physics·2007· 42 cited
Swift heavy ion induced modifications of silicon (sub) oxide nitride layer structures
Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms·2007· 16 cited
Nano-scale effects of swift heavy ion irradiation in SiO layers and multilayers
Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms·2006· 18 cited
Generalized Keller-Simmons formula for nonisothermal plasma-assisted sputtering depositions
Applied Physics Letters·2006· 28 cited
Characterization of the ion cathode fall region in relation to the growth rate in plasma sputter deposition
The European Physical Journal D·2006· 3 cited
Study of the gas rarefaction phenomenon in a magnetron sputtering system
Thin Solid Films·2006· 32 cited
Analysis of silicon suboxide films using MeV/amu heavy ions
Izvestiya Akademii Nauk. Rossijskaya Akademiya Nauk. Seriya Fizicheskaya·2006
On-line characterisation of radiofrequency magnetron sputter deposition of SiOx using elastic recoil detection
Thin Solid Films·2005· 4 cited
Characterization of an Ar/O2 magnetron sputtering plasma using a Langmuir probe and an energy resolved mass spectrometer
Thin Solid Films·2005· 7 cited
Gas heating in plasma-assisted sputter deposition
Applied Physics Letters·2005· 28 cited
Electronic Sputtering of Silicon Suboxide Films by Swift Heavy Ions
Physical Review Letters·2005· 25 cited
High-energy ion-beam-induced phase separation in<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mrow><mml:mi mathvariant="normal">Si</mml:mi><mml:msub><mml:mi mathvariant="normal">O</mml:mi><mml:mi>x</mml:mi></mml:msub></mml:mrow></mml:math>films
Physical Review B·2005· 70 cited
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Frequent Co-authors

A. E. T. Kuiper(13), A. M. Vredenberg(9), W. F. van der Weg(8), C. H. M. Marée(6), W.M. Arnoldbik(6), Alberto Palmero(6), S. J. Roosendaal(5), G.A. Bootsma(5), Y. Tamminga(5), H. Rudolph(5), P.H. Bolt(4), M. F. C. Willemsen(4), E.D. van Hattum(4), J.W. Geus(3), W. M. Arnold Bik(3), K. van Dijk(3), J. Verhoeven(3), John A. Jansen(3), N. Tomozeiu(3), H. G. Schaeken(2)