Yoshikatsu Kojima

Engineering · Physical Sciences

10h-index254citations34works0.02yr avg
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Research Topics

Advancements in Photolithography Techniques(16), Integrated Circuits and Semiconductor Failure Analysis(11), Semiconductor materials and devices(8), Electron and X-Ray Spectroscopy Techniques(8), Ion-surface interactions and analysis(5)

Publications34 total

EBDW technology for EB shuttle at 65nm node and beyond
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2008· 18 cited
The reliability of reflow soldering by hot air reflow
2003· 4 cited
A stacked capacitor with an MOCVD-(Ba,Sr)TiO/sub 3/ film and a RuO/sub 2//Ru storage node on a TiN-capped plug for 4 Gbit DRAMs and beyond
2002· 14 cited
1G DRAM cell with diagonal bit-line (DBL) configuration and edge operation MOS (EOS) FET
2002· 12 cited
Improved 0.12 μm EB direct writing for Gbit DRAM fabrication
2002· 2 cited
Dynamic analysis of a stencil mask
Microelectronic Engineering·2002
The influence of the Coulomb interaction effect in the electron beam on the developed resist structure for the projection lithography
Microelectronic Engineering·2001
Influence of the scattered electrons at the mask in a projection lithography system
Microelectronic Engineering·2001· 1 cited
Influence of electron acceleration voltage in the cell-projection lithography system
Microelectronic Engineering·2000· 1 cited
Influence of the mask-scattered electrons in the cell-projection lithography
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena·1999· 9 cited
Inspection of stencil mask using transmission electrons for character projection electron beam lithography
Microelectronic Engineering·1999· 2 cited
Highly accurate stitching method between cell projection and variably shaped e-beam shots
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·1998
0.15 µm Electron Beam Direct Writing for Gbit Dynamic Random Access Memory Fabrication
Japanese Journal of Applied Physics·1997· 5 cited
Improved Registration Accuracy in E-Beam Direct Writing Lithography
Japanese Journal of Applied Physics·1993
0.25 µm Electron Beam Direct Writing Techniques for 256 Mbit Dynamic Random Access Memory Fabrication
Japanese Journal of Applied Physics·1993· 4 cited
High-resolution focused ion beam lithography
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena·1991· 35 cited
Electrical properties of SN contracts with cleaved oxide superconductor films
IEEE Transactions on Magnetics·1991· 6 cited
Cleaved surfaces of high Tc films for making SNS structures
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·1991
Fluorine field ion source using fluorine–helium gas mixture
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films·1991
High-resolution focused ion beam lithography
Microelectronic Engineering·1990· 13 cited
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Frequent Co-authors

Shinji Matsui(13), Yukinori Ochiai(11), K. Nakajima(6), H. Tsuge(5), Masaki Yamabe(5), S. Matsui(4), M. Kotera(4), Tsuyoshi Yoshitake(3), N. Matsukura(3), Takashi Okagawa(3), Koji Matsuoka(3), Hiroshi Yamashita(3), Naka Onoda(3), Hiroshi Nozue(3), Akira Yoshida(3), M. Sakai(3), Yoichi Tomo(3), Toshiyuki Honda(2), Yoshifusa Wada(2), K. Yamaguchi(2)