Alberto Cabral

MIT Lincoln Laboratory — United States

Engineering · Physical Sciences

8h-index136citations16works1.02yr avg
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Research Topics

Advancements in Photolithography Techniques(9), Integrated Circuits and Semiconductor Failure Analysis(4), Electron and X-Ray Spectroscopy Techniques(3), Modular Robots and Swarm Intelligence(3), Surface Modification and Superhydrophobicity(2)

Publications16 total

Micro-Compound Parabolic Concentrator (µCPC) arrays as an alternative to microlens arrays for avalanche photodiodes
2025
On Efficient Data Sharing for Planetary Digital Twins: Distributed Microplastic Monitoring
2024· 2 citedOpen Access
Energy-Efficient LoRaWan Communication: Real-Time Applications in Aquaculture
2024· 1 citedOpen Access
SUPPORTING AQUACULTURE APPLICATIONS WITH LOW-POWER DATA COMMUNICATION: A CASE OF STUDY ON MULTITROPHIC FARMING WITH LORAWAN TECHNOLOGY
Zenodo (CERN European Organization for Nuclear Research)·2023Open Access
Switchable electrowetting of droplets on dual-scale structured surfaces
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena·2012· 4 cited
Reversible Electrowetting on Dual-Scale-Patterned Corrugated Microstructured Surfaces
Journal of Microelectromechanical Systems·2012· 11 cited
Polymer photochemistry at the EUV wavelength
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2010· 17 citedOpen Access
PAG segregation during exposure affecting innate material roughness
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2009· 8 cited
Sensitivity of EUV resists to out-of-band radiation
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2009· 12 cited
PAG segregation during exposure affecting innate material roughness
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2007· 20 citedOpen Access
Changes in resist glass transition temperatures due to exposure
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2007· 8 cited
Contribution of photoacid generator to material roughness
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena·2006· 14 cited
Contributions to innate material roughness in resist
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2006· 18 cited
Resist materials for advanced lithography
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2005· 11 cited
Quantum efficiency of PAG decomposition in different polymer matrices at advanced lithographic wavelengths
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2003· 8 cited
Fluoroaromatic Resists for 157-nm Lithography.
Journal of Photopolymer Science and Technology·2002· 2 citedOpen Access

Frequent Co-authors

Theodore H. Fedynyshyn(10), David K. Astolfi(5), J. M. Roberts(5), Roger F. Sinta(4), Indira Pottebaum(4), Russell B. Goodman(3), Lalitha Parameswaran(3), Bruna Guterres(3), Luís Poersch(3), Wilson Wasielesky(3), Marcelo Pias(3), Robert P. Meagley(2), Shaun Berry(2), William A. Mowers(2), Everson Flores(2), Lucas Cordova(2), Diogo Guimarães(2), Ahmed Janati(2), Vinícius Machado de Oliveira(2), Aline Bezerra(2)