Hiroto Ohtake

Hitachi (Japan) — Japan

Engineering · Physical Sciences

14h-index706citations52works0.02yr avg
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Research Topics

Semiconductor materials and devices(26), Plasma Diagnostics and Applications(24), Metal and Thin Film Mechanics(11), Copper Interconnects and Reliability(11), Animal testing and alternatives(9)

Publications52 total

Silicon oxide etching mechanism by hydrogen fluoride and methanol vapor mixture
Japanese Journal of Applied Physics·2024Open Access
Reactive oxygen species (ROS) assay-based photosafety screening for complex ingredients: Modification of the ROS assay protocol
The Journal of Toxicological Sciences·2022· 3 citedOpen Access
Tranilast-loaded amorphous solid dispersion prepared with fine droplet drying process for improvement of oral absorption and anti-inflammatory effects on chemically-induced colitis
Journal of Drug Delivery Science and Technology·2021· 6 cited
Phototoxic risk assessment of dermally-applied chemicals with structural variety based on photoreactivity and skin deposition
Regulatory Toxicology and Pharmacology·2020· 9 cited
Photochemically stabilized formulation of dacarbazine with reduced production of algogenic photodegradants
International Journal of Pharmaceutics·2019· 9 cited
Enzymatic reactive oxygen species assay to evaluate phototoxic risk of metabolites
Toxicology Letters·2017· 2 cited
SiN etching characteristics of Ar/CH<sub>3</sub>F/O<sub>2</sub> plasma and dependence on SiN film density
Japanese Journal of Applied Physics·2016· 21 cited
Development of fluorometric reactive oxygen species assay for photosafety evaluation
Toxicology in Vitro·2016· 16 cited
Comparative study on prediction performance of photosafety testing tools on photoallergens
Toxicology in Vitro·2016· 9 cited
Photosafety testing of dermally-applied chemicals based on photochemical and cassette-dosing pharmacokinetic data
Asian Journal of Pharmaceutical Sciences·2015· 1 citedOpen Access
Photochemical Mechanism of Riboflavin-Induced Degradation of Famotidine and a Suggested Pharmaceutical Strategy for Improving Photostability
Journal of Pharmaceutical Sciences·2015· 8 citedOpen Access
Characterization of CO2 plasma ashing for less low-dielectric-constant film damage
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films·2015· 13 cited
Mechanisms of silicon damage during N2/H2 organic etching for fin field-effect-transistor CMOS
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena·2015· 7 cited
New Photosafety Assessment Strategy Based on the Photochemical and Pharmacokinetic Properties of Both Parent Chemicals and Metabolites
Drug Metabolism and Disposition·2015· 6 cited
Phototoxic Risk Assessments on Benzophenone Derivatives: Photobiochemical Assessments and Dermal Cassette-Dosing Pharmacokinetic Study
Journal of Pharmacology and Experimental Therapeutics·2015· 21 cited
Highly selective and precisely controlled aluminum etching by Ar/HBr/CH
Japanese Journal of Applied Physics·2014· 1 cited
Highly selective and precisely controlled aluminum etching by Ar/HBr/CH<sub>3</sub>F/O<sub>2</sub> gas chemistry
Japanese Journal of Applied Physics·2014· 5 cited
Prediction of etching-shape anomaly due to distortion of ion sheath around a large-scale three-dimensional structure by means of on-wafer monitoring technique and computer simulation
Journal of Physics D Applied Physics·2013· 4 cited
Thermomechanical Resist Removal-Cleaning System Using Cryogenic Micro-Slush Jet
Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena·2012· 3 cited
Reduction in Number of Sparks Generated in High-Density Plasma Process by Fixing the Wall Potential
Japanese Journal of Applied Physics·2011· 1 cited
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Frequent Co-authors

Seiji Samukawa(28), Yoshiki Seto(11), Satomi Onoue(11), Butsurin Jinnai(5), Tomohiro Kubota(4), Y. Hayashi(4), Michio Sato(4), E. Soda(3), Yoshinari Ichihashi(3), S. Kadomura(3), Masaru Sasaki(3), Ko Noguchi(3), Masashi Kato(3), Hideyuki Sato(3), Tetsu Mieno(2), Seiichi Fukuda(2), Shuichi Saito(2), Shigeo Yasuhara(2), Juhyun Chung(2), Kunitoshi Tajima(2)