Kouji Kondou

Engineering · Physical Sciences

8h-index185citations27works0.02yr avg
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Research Topics

Ion-surface interactions and analysis(20), Integrated Circuits and Semiconductor Failure Analysis(15), Diamond and Carbon-based Materials Research(13), Metal and Thin Film Mechanics(3), Electron and X-Ray Spectroscopy Techniques(3)

Publications27 total

Dealing with Hot Weather Concrete for Supervisors
Concrete Journal·2013Open Access
A Control of Plastic Resin Flow for Simultaneous Press Process with Embedded Devices Technology
Journal of The Japan Institute of Electronics Packaging·2010· 3 citedOpen Access
Contents (in English)
Journal of The Japan Institute of Electronics Packaging·2010Open Access
Production and Applications of Metal-cluster-complex Ion Beams
Journal of the Vacuum Society of Japan·2009Open Access
Focusing of Ion Beams by Using a Capillary
Journal of the Vacuum Society of Japan·2009Open Access
Cluster SIMS using metal cluster complex ions
Applied Surface Science·2008· 7 cited
Factorial analysis of cluster-SIMS depth profiling using metal-cluster-complex ion beams
Applied Surface Science·2008
High depth resolution SIMS analysis using metal cluster complex ion bombardment
Journal of Physics Conference Series·2008· 6 citedOpen Access
Secondary-Ion-Mass-Spectrometry Depth Profiling of Ultra-shallow Boron Delta Layers in Silicon with Massive Molecular Ion Beam of Ir<sub>4</sub>(CO)<sub>7</sub> <sup>+</sup>
Japanese Journal of Applied Physics·2007· 10 cited
HOPG surface irradiated by metal cluster complex ions
Materials Science and Engineering B·2007
Characteristics of altered layers formed by sputtering with a massive molecular ion containing diverse elements with large mass differences
Journal of Applied Physics·2007· 5 cited
Beam-induced Nanoscale Ripple Formation on Silicon with the Metal-Cluster-Complex Ion of Ir<sub>4</sub>(CO)<sub>7</sub> <sup>+</sup>
Japanese Journal of Applied Physics·2007· 7 cited
Observation of a Si surface sputtered by an ion irradiation system using a prototype compact cluster ion source
Surface and Coatings Technology·2007· 2 cited
Sputtered Si surface irradiated by metal cluster complex ions such as Os3(CO)12 and Ir4(CO)12
Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms·2007· 4 cited
Irradiation characteristics of metal-cluster-complex ions containing diverse multi-elements with large mass differences
Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms·2007· 8 cited
SIMS depth profile study using metal cluster complex ion bombardment
Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms·2006· 15 cited
Characteristics of a cluster‐ion beam of Os<sub>3</sub>(CO)<sub><i>n</i></sub><sup>+</sup> (<i>n</i> = 7 or 8) for low‐damage sputtering
Surface and Interface Analysis·2006· 9 cited
Secondary Ion Mass Spectrometry of Organic Thin Films Using Metal-Cluster-Complex Ion Source
Japanese Journal of Applied Physics·2006· 18 cited
Ion-beam characteristics of the metal cluster complex of Ir4(CO)12
Journal of Applied Physics·2006· 24 cited
Depth resolution improvement in secondary ion mass spectrometry analysis using metal cluster complex ion bombardment
Applied Physics Letters·2006· 31 cited
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Frequent Co-authors

Yukio Fujiwara(20), Hidehiko Nonaka(20), Toshiyuki Fujimoto(18), Shingo Ichimura(18), Akira Kurokawa(14), Yoshikazu Teranishi(10), Mitsuhiro Tomita(10), Naoaki Saito(9), Kouji Watanabe(6), Yuichi Teranishi(4), Hiroshi Itoh(4), M. Tomita(3), T. Kinno(3), M. Koike(3), Hiroki Tanaka(3), Shiro Takeno(3), Mitsuo Matsudaira(3), Hiroyuki HANAO(3), Misuhiro Tomita(2), Kazuhiro Yamamoto(2)