Hidehiko Nonaka

National Institute of Advanced Industrial Science and TechnologyJapan

Engineering · Physical Sciences

19h-index1.2kcitations158works1.52yr avg

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Research Topics

Ion-surface interactions and analysis(43), Semiconductor materials and devices(41), Diamond and Carbon-based Materials Research(28), Thin-Film Transistor Technologies(20), Silicon Nanostructures and Photoluminescence(20)

Publications156 total

Japanese Journal of Applied Physics·2025· 3 cited
Properties of low-temperature ALD Al 2 O 3 film by high purity ozone
The Japan Society of Applied Physics·2020
XPS analysis of a low-temperature ALD film by high purity ozone and ethylene with TMA
The Japan Society of Applied Physics·2020
WVTR of Al 2 O 3 film deposited at room temperature using Pure-Ozone-ALD process with TMA
The Japan Society of Applied Physics·2020
Effect of process conditions on properties of an OER- CVD SiO 2 film at room temperature
The Japan Society of Applied Physics·2019
Al 2 O 3 barrier film growth at room temperature by ALD with active species from high purity ozone gas
The Japan Society of Applied Physics·2019
Properties of a CVD-SiO 2 film at room temperature by active species from high purity ozone gas
The Japan Society of Applied Physics·2018
Journal of Surface Analysis·2018Open Access
Journal of the Vacuum Society of Japan·2012· 1 citedOpen Access
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Frequent Co-authors

Shingo Ichimura(35), Akira Kurokawa(15), Yukio Fujiwara(15), Toshiyuki Fujimoto(13), Tetsuya Nishiguchi(10), Kazuo Arai(10), Naoaki Saito(10), Kouji Kondou(9), Atsushi Suzuki(8), Yoshiki Morikawa(6), Mitsuru Kekura(6), Takashi Shimizu(6), Mitsuhiro Tomita(6), Yoshikazu Teranishi(5), N. Kameda(4), Masaharu Miyamoto(3), Shunsuke Hosokawa(3), Ken Nakamura(3), Taisuke Nakanaga(3), Kouji Watanabe(3)