Antti Rahtu

University of Helsinki — Finland

Engineering · Physical Sciences

24h-index3.7kcitations42works0.02yr avg
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Research Topics

Semiconductor materials and devices(30), Electronic and Structural Properties of Oxides(23), Catalytic Processes in Materials Science(18), Copper Interconnects and Reliability(7), Crystallization and Solubility Studies(7)

Publications42 total

Etching of Nb<sub>2</sub>O<sub>5</sub> Thin Films by NbCl<sub>5</sub>
Chemical Vapor Deposition·2009· 32 cited
Reaction Mechanism Studies on Atomic Layer Deposition of Nb<sub>2</sub>O<sub>5</sub> from Nb(OEt)<sub>5</sub> and Water
Langmuir·2009· 17 cited
Scale-up of the BaTiO<sub>3</sub> ALD Process onto 200 mm Wafer
ECS Transactions·2006· 9 cited
Atomic Layer Deposition of NbN and Nb(Si)N for Metal Electrodes
ECS Transactions·2006· 3 cited
High-k Dielectric Growth on Germanium by Atomic Layer Deposition
ECS Meeting Abstracts·2006
High-k Dielectric Growth on Germanium by Atomic Layer Deposition
2006
Scale-up of the BaTiO3 ALD Process onto 200 mm Wafer
ECS Meeting Abstracts·2006Open Access
Atomic Layer Deposition of Ultrathin Copper Metal Films from a Liquid Copper(I) Amidinate Precursor
Journal of The Electrochemical Society·2006· 212 cited
In Situ Quadrupole Mass Spectrometry Study of Atomic-Layer Deposition of ZrO<sub>2</sub> Using Cp<sub>2</sub>Zr(CH<sub>3</sub>)<sub>2</sub> and Water
Langmuir·2005· 47 cited
In Situ Reaction Mechanism Studies on the Atomic Layer Deposition of Al<sub>2</sub>O<sub>3</sub> from (CH<sub>3</sub>)<sub>2</sub>AlCl and Water
Langmuir·2005· 26 cited
Recent developments in the MOCVD and ALD of rare earth oxides and silicates
Materials Science and Engineering B·2005· 136 cited
Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films
Journal of The Electrochemical Society·2004· 63 cited
Atomic Layer Deposition of Photocatalytic TiO<sub>2</sub> Thin Films from Titanium Tetramethoxide and Water
Chemical Vapor Deposition·2004· 217 cited
Atomic layer deposition of lanthanum aluminum oxide nano-laminates for electrical applications
Applied Physics Letters·2004· 83 cited
CCDC 229486: Experimental Crystal Structure Determination
The Cambridge Structural Database·2004Open Access
CCDC 229483: Experimental Crystal Structure Determination
The Cambridge Structural Database·2004Open Access
Some recent developments in the MOCVD and ALD of high-κ dielectric oxides
Journal of Materials Chemistry·2004· 81 cited
CCDC 229481: Experimental Crystal Structure Determination
The Cambridge Structural Database·2004Open Access
CCDC 229484: Experimental Crystal Structure Determination
The Cambridge Structural Database·2004Open Access
CCDC 229480: Experimental Crystal Structure Determination
The Cambridge Structural Database·2004Open Access
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Frequent Co-authors

Mikko Ritala(26), Markku Leskelä(13), Roy G. Gordon(11), Jin‐Seong Park(8), Byeong Soo Lim(7), Kaupo Kukli(6), Raija Matero(6), Suvi Haukka(5), M. Tuominen(5), Timo Sajavaara(4), Booyong S. Lim(3), Marika Juppo(3), Matti Putkonen(3), Petri I. Räisänen(2), Anthony C. Jones(2), Helen C. Aspinall(2), Paul R. Chalker(2), Richard J. Potter(2), Kjell Knapas(2), Kirsi Ralli(2)