Gosuke Shiraishi

Tokyo Electron (Japan) — Japan

Engineering · Physical Sciences

8h-index110citations14works0.02yr avg
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Research Topics

Advancements in Photolithography Techniques(11), Integrated Circuits and Semiconductor Failure Analysis(11), Advanced Surface Polishing Techniques(6), Electron and X-Ray Spectroscopy Techniques(3), Mesoporous Materials and Catalysis(1)

Publications14 total

EUV resist chemical gradient enhancement by UV flood exposure for improvement in EUV resist resolution, process control, roughness, sensitivity and stochastic defectivity
2020· 10 cited
EUVレジスト分解能,プロセス制御,粗さ,感度および確率的欠陥性改善のためのUVフラッディング露光によるEUVレジスト化学勾配増強【JST・京大機械翻訳】
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2020
PSCAR optimization to reduce EUV resist roughness with sensitization using Resist Formulation Optimizer (RFO) (Conference Presentation)
2019
Constructing a robust PSCARTM process for EUV (Conference Presentation)
2018
EUV resist sensitization and roughness improvement by PSCAR with in-line flood exposure system (Conference Presentation)
2018· 1 cited
EUVのためのロバストなPSCARプロセスの構築【JST・京大機械翻訳】
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2018
Simulation and experimentation of PSCAR chemistry for complex structures
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2017· 9 cited
Photosensitized Chemically Amplified Resist (PSCAR) 2.0 for high-throughput and high-resolution EUV lithography: dual photosensitization of acid generation and quencher decomposition by flood exposure
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2017· 8 cited
Sensitivity enhancement of chemically amplified resists and performance study using extreme ultraviolet interference lithography
Journal of Micro/Nanolithography MEMS and MOEMS·2016· 21 citedOpen Access
Novel high sensitivity EUV photoresist for sub-7nm node
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2016· 18 citedOpen Access
Sensitivity enhancement of chemically amplified resists and performance study using EUV interference lithography
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2016· 9 citedOpen Access
Challenge toward breakage of RLS trade-off for EUV lithography by Photosensitized Chemically Amplified Resist (PSCAR) with flood exposure
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2016· 17 citedOpen Access
Novel High Sensitivity EUV Photoresist for Sub-7 nm Node
Journal of Photopolymer Science and Technology·2016· 16 citedOpen Access
Fabrication of Porous Smectite/SiO<sub>2</sub> Composites
Key engineering materials·2001· 1 cited

Frequent Co-authors

Seiji Nagahara(13), Yukie Minekawa(11), Kosuke Yoshihara(11), Hisashi Nakagawa(10), Tomoki Nagai(10), Takehiko Naruoka(10), Akihiro Oshima(10), Seiichi Tagawa(9), Kathleen Nafus(7), Philippe Foubert(7), Geert Vandenberghe(7), Elizabeth Buitrago(6), Yasin Ekinci(6), Michael Carcasi(6), Oktay Yildirim(5), Marieke Meeuwissen(5), Coen Verspaget(5), Rik Hoefnagels(5), Gijsbert Rispens(5), Yuichi Terashita(5)