Yasin Ekinci

Paul Scherrer Institute — Switzerland

Engineering · Physical Sciences

47h-index8.2kcitations343works7.42yr avg
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Research Topics

Advancements in Photolithography Techniques(209), Integrated Circuits and Semiconductor Failure Analysis(104), Electron and X-Ray Spectroscopy Techniques(91), Nanofabrication and Lithography Techniques(66), Advanced X-ray Imaging Techniques(57)

Publications343 total

Reconstruction of 3D line/space pattern morphologies from top-down SEM images
2026
Extreme ultraviolet induced reactions of tin–oxo cage photoresists
Journal of Materials Chemistry C·2026Open Access
Imaging of electrically controlled van der Waals layer stacking in 1T-TaS2
Nature Communications·2025· 1 citedOpen Access
Multibenzyl Chloride Based Molecular Resists Enabling 13 nm Half-Pitch Lithography via Self-Cross-Linking
ACS Applied Polymer Materials·2025
Fast ptychographic imaging of semiconductor structures at grazing incidence
2025
Coherent diffractive imaging simulations for wafer inspection of periodic structures
Journal of Micro/Nanopatterning Materials and Metrology·2025Open Access
Multi-Benzyl Chloride Based Molecular Resists Enabling 13 nm Half-Pitch Lithography via Self-Crosslinking
2025Open Access
Phase retrieval of periodic patterns
2025
Ultralow line edge roughness of hybrid multilayer Extreme ultraviolet resist with vertical molecular wire structure
Materials Today·2025· 5 cited
New EUV interference lithography tool at PSI: pushing the limits of resolution beyond hyper NA EUVL
2025
Nonchemically‐Amplified Molecular Resists Based on Calixarene Derivatives Enabling 14 nm Half‐Pitch Nanolithography
Chinese Journal of Chemistry·2025· 6 citedOpen Access
Impact of Sn Particle-Induced Mask Diffraction on EUV Lithography Performance Across Different Pattern Types
Photonics·2025· 1 citedOpen Access
Performance Optimization of Sulfonium-Functionalized Molecular Resists for EUV and Electron Beam Lithography
ACS Applied Electronic Materials·2025· 2 cited
Prior–primed deep neural network based EUV mask inspection
Optics Express·2025· 2 citedOpen Access
Roadmap on atomic-scale semiconductor devices
Nano Futures·2025· 13 citedOpen Access
Roadmap on Atomic-scale Semiconductor Devices
arXiv (Cornell University)·2025· 1 citedOpen Access
van der Waals devices for surface-sensitive experiments
Nanoscale·2025Open Access
Imaging of electrically controlled van der Waals layer stacking in 1<em>T</em>-TaS<sub>2</sub>
DORA PSI (Paul Scherrer Institute)·2025Open Access
Extreme ultraviolet lithography
Nature Reviews Methods Primers·2024· 75 cited
"A MICROFLUIDIC CAPILLARY DEVICE FOR LOW-COST, RAPID, AND MULTIPLEXED IMMUNOASSAYS IN WHOLE BLOOD"
2024Open Access
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Frequent Co-authors

Michaela Vockenhuber(11), J. Gobrecht(8), Harun H. Solak(8), Olivier J. F. Martin(6), Ryan Del Re(6), Robert L. Brainard(6), Dimitrios Kazazis(6), Jeroen A. van Bokhoven(5), H. Sigg(5), Nassir Mojarad(5), Sonia Castellanos(5), Mark Neisser(5), Waiz Karim(4), Jörg F. Löffler(4), H. H. Solak(4), Daniel Freedman(4), Birgit Päivänranta(4), Christian Dávid(4), Jarich Haitjema(4), Albert M. Brouwer(4)