J. Gobrecht

Paul Scherrer Institute — Switzerland

Engineering · Physical Sciences

41h-index5.9kcitations156works0.02yr avg
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Research Topics

Nanofabrication and Lithography Techniques(43), Advancements in Photolithography Techniques(32), Force Microscopy Techniques and Applications(26), Optical Coatings and Gratings(17), Advanced Surface Polishing Techniques(12)

Publications155 total

NFFA - Nanoscience Foundries and Fine Analysis - A EUROPEAN OPEN-ACCESS DISTRIBUTED RESEARCH INFRASTRUCTURE FOR NANOSCIENCE AND ADVANCED ANALYSIS
Zenodo (CERN European Organization for Nuclear Research)·2020Open Access
Analysis of Thin Thermal Oxides on (0001) SiC Epitaxial Layers
Materials science forum·2017· 2 citedOpen Access
Analysis of 4H-SiC MOS Capacitors on Macro-Stepped Surfaces
Materials science forum·2017· 8 citedOpen Access
Electronic band structure of the buried SiO2/SiC interface investigated by soft x-ray ARPES
Applied Physics Letters·2017· 8 citedOpen Access
Protective effect of ultrathin alumina film against diffusion of iron into carbon fiber during growth of carbon nanotubes for hierarchical composites investigated by ptychographic X-ray computed tomography
Carbon·2017· 9 citedOpen Access
Catalyst support effects on hydrogen spillover
Nature·2017· 1.0k cited
Scanning coherent scattering methods for actinic EUV mask inspection
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2016· 8 citedOpen Access
Sub-wavelength printing in the deep ultra-violet region using Displacement Talbot Lithography
Microelectronic Engineering·2016· 25 cited
Size-dependent redox behavior of iron observed by in-situ single nanoparticle spectro-microscopy on well-defined model systems
Scientific Reports·2016· 69 citedOpen Access
Scanning Coherent Scattering Methods for Actinic EUV Mask Inspection
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2016
Device Simulations on Novel High Channel Mobility 4H-SiC Trench MOSFETs and Their Fabrication Processes
Microelectronic Engineering·2015· 4 cited
Interference lithography at EUV and soft X-ray wavelengths: Principles, methods, and applications
Microelectronic Engineering·2015· 107 cited
Beyond EUV lithography: a comparative study of efficient photoresists' performance
Scientific Reports·2015· 142 citedOpen Access
Single-digit-resolution nanopatterning with extreme ultraviolet light for the 2.5 nm technology node and beyond
Nanoscale·2015· 101 cited
High-resolution and large-area nanoparticle arrays using EUV interference lithography
Nanoscale·2015· 64 cited
Ultra-dense silicon nanowires using extreme ultraviolet interference lithography
2014· 2 cited
Nanoimprint lithography process chains for the fabrication of micro- and nanodevices
Journal of Micro/Nanolithography MEMS and MOEMS·2014· 22 citedOpen Access
Nearly amorphous Mo-N gratings for ultimate resolution in extreme ultraviolet interference lithography
Nanotechnology·2014· 10 cited
High-throughput fabrication of compact and flexible bilayer nanowire grid polarizers for deep-ultraviolet to infrared range
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena·2014· 12 citedOpen Access
Broadband interference lithography at extreme ultraviolet and soft x-ray wavelengths
Optics Letters·2014· 49 cited
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Frequent Co-authors

Helmut Schift(19), Christian Dávid(10), Yasin Ekinci(8), Laura J. Heyderman(7), H. Gerischer(6), Celestino Padeste(5), Sunggook Park(4), Nassir Mojarad(4), Waiz Karim(3), Jeroen A. van Bokhoven(3), C. David(3), G. Kopitkovas(3), Thomas Lippert(3), Alexander Wokaun(3), Armin Kleibert(2), H. H. Solak(2), Paul F. Nealey(2), Gabriel Magariños(2), Wolf-Dieter Kaiser(2), L. Scandella(2)