Nassir Mojarad

Paul Scherrer Institute — Switzerland

Engineering · Physical Sciences

10h-index609citations15works0.02yr avg
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Research Topics

Advancements in Photolithography Techniques(8), Integrated Circuits and Semiconductor Failure Analysis(6), Microfluidic and Bio-sensing Technologies(5), Nanofabrication and Lithography Techniques(4), Microfluidic and Capillary Electrophoresis Applications(3)

Publications15 total

Fabrication of high aspect ratio and tilted nanostructures using extreme ultraviolet and soft x-ray interference lithography
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena·2021· 10 citedOpen Access
Pneumatically Controlled Nanofluidic Devices for Contact‐Free Trapping and Manipulation of Nanoparticles
Particle & Particle Systems Characterization·2018· 7 cited
Soft electrostatic trapping in nanofluidics
Microsystems & Nanoengineering·2017· 15 citedOpen Access
Monitoring the transformation of aliphatic and fullerene molecules by high-energy electrons using surface-enhanced Raman spectroscopy
Nanotechnology·2017· 3 cited
Nanofluidic lab-on-a-chip trapping devices for screening electrostatics in concentration gradients
Microelectronic Engineering·2016· 7 cited
Enhancement of the intrinsic fluorescence of adenine using aluminum nanoparticle arrays
Optics Express·2015· 31 citedOpen Access
Interference lithography at EUV and soft X-ray wavelengths: Principles, methods, and applications
Microelectronic Engineering·2015· 107 cited
Beyond EUV lithography: a comparative study of efficient photoresists' performance
Scientific Reports·2015· 142 citedOpen Access
Glass-based geometry-induced electrostatic trapping devices for improved scattering contrast imaging of nano-objects
Microelectronic Engineering·2015· 14 cited
Single-digit-resolution nanopatterning with extreme ultraviolet light for the 2.5 nm technology node and beyond
Nanoscale·2015· 101 cited
EUV resists towards 11nm half-pitch
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2014· 15 citedOpen Access
Broadband interference lithography at extreme ultraviolet and soft x-ray wavelengths
Optics Letters·2014· 49 cited
Measuring three-dimensional interaction potentials using optical interference
Optics Express·2013· 21 citedOpen Access
Patterning at 6.5 nm wavelength using interference lithography
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2013· 9 citedOpen Access
Evaluation of EUV resist performance with interference lithography towards 11 nm half-pitch and beyond
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2013· 78 citedOpen Access

Frequent Co-authors

Yasin Ekinci(13), J. Gobrecht(4), Michael Adrian Gerspach(4), Thomas Pfohl(4), Michaela Vockenhuber(3), Deepika Sharma(3), Mohamad Hojeij(2), Li Wang(2), Daniel Fan(2), L. Wang(1), Shankar Kumar Jha(1), Mario Agio(1), Jörg F. Löffler(1), Vahid Sandoghdar(1), Madhavi Krishnan(1), Dimitrios Kazazis(1), Bernd Terhalle(1), Jean‐Nicolas Tisserant(1), Hannes Beyer(1), Hao Dong(1)