Harun H. Solak

Engineering · Physical Sciences

33h-index6.0kcitations107works0.62yr avg
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Research Topics

Advancements in Photolithography Techniques(40), Nanofabrication and Lithography Techniques(37), Block Copolymer Self-Assembly(21), Optical Coatings and Gratings(20), Advanced Polymer Synthesis and Characterization(12)

Publications107 total

Comparative simulation analysis of displacement Talbot lithography and projection lithography for high-resolution periodic patterning
2025
Fabrication feasibility of high-quality SRG waveguides for augmented reality applications
2025
Enhancing displacement Talbot lithography through inverse-designed curvilinear masks and multibeam mask writing
2025
P‐107: High‐Resolution Periodic Patterning for Volume Manufacturing on +300mm Size Substrates Using Displacement Talbot Lithography
SID Symposium Digest of Technical Papers·2024
300mm+ substrate UV/DUV low-cost, reliable periodic patterning solution for high-volume manufacturing
2024
Simulating use of displacement Talbot lithography for high volume AR waveguide manufacturing
2024· 2 cited
Inverse lithography mask design of displacement Talbot lithography enabled by optimization method
2024· 2 cited
Modeling tools for use of displacement Talbot lithography for high volume AR waveguide manufacturing
2024· 1 cited
Displacement Talbot lithography process simulation analysis
2023· 2 cited
Production of AR/VR waveguides with displacement Talbot lithography
2022
Displacement talbot lithography: a new and versatile technology for printing periodic nanostructures (Conference Presentation)
2022
GaAs nanowires on Si nanopillars: towards large scale, phase-engineered arrays
Nanoscale Horizons·2022· 7 citedOpen Access
High-aspect ratio silicon structures by displacement Talbot lithography and Bosch etching
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2017· 36 citedOpen Access
High rotational symmetry photonic structures fabricated with multiple exposure Displacement Talbot Lithography
Microelectronic Engineering·2017· 7 cited
High-resolution, high-aspect-ratio iridium–nickel composite nanoimprint molds
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena·2016· 5 cited
Sub-wavelength printing in the deep ultra-violet region using Displacement Talbot Lithography
Microelectronic Engineering·2016· 25 cited
Phase shifting masks in Displacement Talbot Lithography for printing nano-grids and periodic motifs
Microelectronic Engineering·2015· 27 cited
High-throughput fabrication of compact and flexible bilayer nanowire grid polarizers for deep-ultraviolet to infrared range
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena·2014· 12 citedOpen Access
Pinhole diffraction holography for fabrication of high-resolution Fresnel Zone Plates
Optics Express·2014· 3 citedOpen Access
Bilayer wire-grid polarizers for DUV to IR fabricated using EUV interference and nanoimprint lithography
2013· 1 cited
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Frequent Co-authors

Paul F. Nealey(17), Mark P. Stoykovich(13), Yasin Ekinci(11), Celestino Padeste(8), Juan Pablo(7), Marcus Müller(6), Erik W. Edwards(6), Christian Dais(6), J. Gobrecht(4), Selmiye Alkan Gürsel(4), Sang Ouk Kim(3), H. Sigg(3), C. David(3), Francis Clube(3), János Vörös(3), Vaida Auzelyte(3), Patrick Farquet(3), Günther G. Scherer(3), Detlev Grützmacher(2), E. Müller(2)