Jen-Shiang Wang

ASML (United States) — United States

Engineering · Physical Sciences

6h-index123citations23works0.02yr avg
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Research Topics

Advancements in Photolithography Techniques(12), Industrial Vision Systems and Defect Detection(5), Photonic and Optical Devices(4), Adaptive optics and wavefront sensing(4), Optical Coatings and Gratings(4)

Publications23 total

Hybrid mask 3D modeling driven by both physical solution and machine learning
2025
A holistic approach to model-based stochastic-aware computational lithography
2023· 1 cited
Contour-based variability decomposition for stochastic band metrology
2021
Stochastic defect criticality prediction enabled by physical stochastic modeling and massive metrology
2021· 3 cited
Massive metrology using fast e-beam technology improves OPC model accuracy by >2x at faster turnaround time
2018· 3 cited
Accurate characterization of 2D etch bias by capturing surrounding effects from resist and trench areas
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2017
Calcium Salts Reduce Acrylamide Formation and Improve Qualities of Cookies
Journal of Food and Nutrition Research·2014· 11 citedOpen Access
Mask process correction (MPC) modeling and its application to EUV mask for electron beam mask writer EBM-7000
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2010· 17 cited
Performance and stability of mask process correction for EBM-7000
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2010· 1 cited
Defect printability analysis by lithographic simulation from high resolution mask images
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2009· 2 cited
Mask-LMC: lithographic simulation and defect detection from high-resolution mask images
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2009
Reconfigurable Optical Wavelength Multiplexer Using a MEMS Tunable Blazed Grating
Journal of Lightwave Technology·2007· 15 cited
Vortex Generation and Pixel Calibration Using a Spatial Light Modulator for Maskless Lithography
2007· 1 cited
Single-Crystal-Silicon Continuous Membrane Deformable Mirror Array for Adaptive Optics in Space-Based Telescopes
IEEE Journal of Selected Topics in Quantum Electronics·2007· 35 cited
Optical Pattern Generation Using a Spatial Light Modulator for Maskless Lithography
IEEE Journal of Selected Topics in Quantum Electronics·2007· 16 cited
High-sensitivity interferometric schemes for ML2 micromirror calibrations
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2006
Spatial Light Modulators for Maskless Lithography
2006· 4 cited
A Reconfigurable Optical Demultiplexer based on a MEMS Deformable Blazed Grating
2006· 2 cited
Single-Crystal-Silicon Continuous Membrane Deformable Mirror Array for Adaptive Optics
2006· 1 cited
High-resolution optical maskless lithography based on micromirror arrays
2006· 1 cited
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Frequent Co-authors

Olav Solgaard(10), Il Woong Jung(6), Rafael C. Howell(6), Shufeng Bai(4), George Z. Chen(4), Tadahiro Takigawa(4), Yongfa Fan(4), Terunobu Kurosawa(3), Yasuko Saito(3), Chang‐An Wang(3), Yves-Alain Peter(2), Emily Carr(2), Takashi Kamikubo(2), Takayuki Ohnishi(2), Shigehiro Hara(2), Hirohito Anze(2), Yoshiaki Hattori(2), Shuichi Tamamushi(2), Jiangwei Li(2), Jun Tao(2)