Rafael C. Howell

Engineering · Physical Sciences

10h-index332citations37works5.02yr avg
OpenAlex↗Google Scholar↗

Accepting Students?

No reports yet. Know if this professor is taking students?

Research Topics

Advancements in Photolithography Techniques(19), Electron and X-Ray Spectroscopy Techniques(8), Industrial Vision Systems and Defect Detection(5), Integrated Circuits and Semiconductor Failure Analysis(5), Advanced Thermodynamics and Statistical Mechanics(4)

Publications37 total

Curvilinear data representation and its impact on file size and lithographic performance
Journal of Micro/Nanopatterning Materials and Metrology·2024· 5 cited
A holistic approach to model-based stochastic-aware computational lithography
2023· 1 cited
Curvilinear data representation and its impact on file size and lithographic performance
2023· 3 cited
Physical dose modeling and throughput optimization in EUV computational lithography
2023· 2 cited
Full chip computational lithography for KrF multi-focal imaging (MFI) (Conference Presentation)
2021
Lithography-defect-driven source-mask optimization solution for full-chip optical proximity correction
Applied Optics·2020· 4 cited
Mathematical Foundations of a Geometric Theory of Diffraction for Light Scattering from a 3D Topographic Photomask
2019· 2 cited
Efficient full-chip SRAF placement using machine learning for best accuracy and improved consistency
2018· 11 cited
Freeform mask optimization using advanced image based M3D inverse lithography and 3D-NAND full chip opc application
2018· 6 cited
Machine learning assisted SRAF placement for full chip
2017· 16 cited
Accurate characterization of 2D etch bias by capturing surrounding effects from resist and trench areas
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2017
EUV resolution enhancement techniques (RETs) for k<sub>1</sub>0.4 and below
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2015· 27 cited
Nanoscale heterogeneity, premartensitic nucleation, and a new plutonium structure in metastable<i>δ</i>fcc Pu-Ga alloys
Physical Review B·2014· 19 cited
EUV source-mask optimization for 7nm node and beyond
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2014· 28 cited
"Smart" source, mask, and target co-optimization to improve design related lithographically weak spots
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2014· 9 cited
Intrinsic Nanoscience of δ Pu–Ga Alloys: Local Structure and Speciation, Collective Behavior, Nanoscale Heterogeneity, and Aging Mechanisms
The Journal of Physical Chemistry C·2014· 12 cited
Mask process correction (MPC) modeling and its application to EUV mask for electron beam mask writer EBM-7000
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2010· 17 cited
Performance and stability of mask process correction for EBM-7000
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2010· 1 cited
Defect printability analysis by lithographic simulation from high resolution mask images
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2009· 2 cited
Mask-LMC: lithographic simulation and defect detection from high-resolution mask images
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2009
page 1 of 2Next →

Frequent Co-authors

Marcelo Gleiser(8), Steven D. Conradson(7), Ángel J. García-Adeva(6), Jen-Shiang Wang(6), Stephen D. H. Hsu(4), Keith Gronlund(4), Francisco J. Espinosa-Faller(4), Shufeng Bai(4), George Z. Chen(4), Jim Wiley(4), Terunobu Kurosawa(4), Tadahiro Takigawa(4), Yen‐Wen Lu(4), Stephen Hsu(4), Austin Peng(4), Yasuko Saito(3), Dezheng Sun(3), Cuiping Zhang(3), Youping Zhang(3), Yu Cao(3)