B. Orlando

STMicroelectronics (France) — France

Engineering · Physical Sciences

9h-index385citations33works0.02yr avg
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Research Topics

Semiconductor materials and devices(9), Advancements in Semiconductor Devices and Circuit Design(9), Advancements in Photolithography Techniques(7), Integrated Circuits and Semiconductor Failure Analysis(6), Photonic and Optical Devices(5)

Publications33 total

Si-photonics waveguides manufacturability using advanced RET solutions
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2017· 1 cited
DAPHNE silicon photonics technological platform for research and development on WDM applications
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2016· 12 cited
OPC for curved designs in application to photonics on silicon
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2016· 6 cited
Patterning critical dimension control for advanced logic nodes
Journal of Micro/Nanolithography MEMS and MOEMS·2015· 2 cited
Recent Progress in Silicon Photonics R&D and Manufacturing on 300mm Wafer Platform
Optical Fiber Communication Conference·2015· 46 cited
MOS Capacitor Deep Trench Isolation for CMOS image sensors
2014· 31 cited
How holistic process control translates into high mix logic fab APC?
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2014· 6 cited
Process Control for Silicon Photonics using 300mm SOI Wafers
2014· 3 cited
A multi-wavelength 3D-compatible silicon photonics platform on 300mm SOI wafers for 25Gb/s applications
2013· 94 cited
Impact of local back biasing on performance in hybrid FDSOI/bulk high-k/metal gate low power (LP) technology
Solid-State Electronics·2013· 10 cited
Overlay improvement through lot-based feed-forward: applications to various 28nm node lithography operations
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2013· 2 cited
Scatterometry-based dose and focus decorrelation: applications to 28nm contact holes patterning intrafield focus investigations
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2013
Impact of local back biasing on performance in hybrid FDSOI/bulk high-k/metal gate low power (LP) technology
2012· 5 cited
Gate-all-around technology: Taking advantage of ballistic transport?
Solid-State Electronics·2010· 22 cited
Gate-All-Around technology: taking advantage of ballistic transport ?
2009· 3 cited
High velocity Si-nanodot : a candidate for SRAM applications at 16nm node and below
HAL (Le Centre pour la Communication Scientifique Directe)·2009· 16 cited
Folded fully depleted FET using Silicon-On-Nothing technology as a highly W-scaled planar solution
Solid-State Electronics·2009· 6 cited
Folded fully depleted FET using Silicon-On-Nothing technology as a highly W-scaled planar solution
HAL (Le Centre pour la Communication Scientifique Directe)·2009
Rectilinear solenoid winding for e.g. permeameter, has turns, whose one of dimensions is variable and determined individually with respect to position of turns along winding and predetermined magnetic characteristic of winding
HAL (Le Centre pour la Communication Scientifique Directe)·2008
Spiral-shaped closed magnetic core and integrated micro-inductance comprising such a closed magnetic core
HAL (Le Centre pour la Communication Scientifique Directe)·2008
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Frequent Co-authors

B. Viala(12), F. Bœuf(9), F. Leverd(7), P. Gouraud(7), P. Perreau(6), T. Skotnicki(6), S. Crémer(5), R. Beneyton(5), G. Bidal(5), S. Denorme(5), N. Loubet(5), T. Salvetat(5), Maxime Gatefait(5), D. Pellissier-Tanon(4), Dominique Fleury(4), S. Barnola(4), J. Ducoté(4), A.S. Royet(4), Nathalie Vulliet(3), Thierry Pinguet(3)