Blake Davis

Engineering · Physical Sciences

8h-index201citations25works0.02yr avg
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Research Topics

Advancements in Photolithography Techniques(9), Copper Interconnects and Reliability(7), Nanofabrication and Lithography Techniques(7), Semiconductor materials and devices(3), 3D IC and TSV technologies(3)

Publications25 total

Structure of human Mcl-1 in complex with BIM BH3 peptide
2019
Frederick Douglass: A Biography
2018
Living Through Rat Hell: The Lives and Escape Attempts of Soldiers at Libby Prison
Montview Journal of Research & Scholarship·2018Open Access
Enhanced desalination performance of polyamide bi-layer membranes prepared by sequential interfacial polymerization
Journal of Membrane Science·2013· 39 cited
High-Throughput Directed Self-Assembly of Core–Shell Ferrimagnetic Nanoparticle Arrays
Langmuir·2013· 23 cited
Novel polyamide bilayer membranes with improved desalination performance
2012
Enhanced RO Performance of Polyamide Bi-layer Membranes Prepared by Sequential Interfacial Polymerization
TechConnect Briefs·2012
Extending photo-patternable low-κ concept to 193nm lithography and e-beam lithography
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2011· 3 cited
Visualization of the develop process
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2011
Facile chemical rearrangement for photopatterning of POSS derivatives
Journal of Materials Chemistry·2011· 10 cited
Topographically directed self-assembly of goldnanoparticles
Journal of Materials Chemistry·2011· 16 cited
Patternable low-кmaterial for “greener” semiconductor manufacturing
2010
Two complementary methods to characterize long range proximity effects due to develop loading
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2010· 3 citedOpen Access
Integration of Photo-Patternable Low-κ Material into Advanced Cu Back-End-Of-The-Line
Japanese Journal of Applied Physics·2010· 6 cited
Multilevel integration of patternable low-κ material into advanced Cu BEOL
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2010· 3 cited
Silsesquioxane-based Photopatternable Porous Low-<i>k</i>Dielectric Materials
MRS Proceedings·2010
Leader emergence in an Internet environment
Computers in Human Behavior·2008· 16 cited
Impact of curing kinetics and materials properties on imprint characteristics of resists for UV nano-imprint lithography
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2007· 3 cited
Studies of acid diffusion in low Ea chemically amplified photoresists
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2005· 5 cited
Evaluation of functional properties of imaging materials for water immersion lithography
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2005· 7 cited
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Frequent Co-authors

Alshakim Nelson(8), Linda K. Sundberg(7), Ratnam Sooriyakumaran(7), William D. Hinsberg(6), Carl E. Larson(6), Qinghuang Lin(6), Robert D. Allen(6), Frances A. Houle(5), Charles Rettner(5), Géraud Dubois(4), Gregory M. Wallraff(4), John A. Hoffnagle(4), David R. Medeiros(4), P. J. Brock(4), Ranee W. Kwong(4), H. Shobha(4), T. Spooner(4), R. Wisnieff(4), Jacquana Diep(3), Radwan Al-Rasheed(3)