Byung Gook Kim

Engineering · Physical Sciences

4h-index57citations25works0.02yr avg
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Research Topics

Advancements in Photolithography Techniques(18), Electron and X-Ray Spectroscopy Techniques(9), Integrated Circuits and Semiconductor Failure Analysis(6), Advanced optical system design(5), Industrial Vision Systems and Defect Detection(4)

Publications25 total

문화예술축제 속성이 방문객 행동의도 및 지역사회 기여도에 미치는 영향 : 지용제를 중심으로
Journal & Article Management System·2024
Novel actinic solution and its application for EUV mask HVM
2022
A customized multifunctional actinic tool for EUV industry
2021
Formation mechanism of the photomask blanks material related haze
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2016· 3 cited
Film loss-free cleaning chemicals for EUV mask lifetime elongation developed through combinatorial chemical screening
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2015· 2 cited
A Study on Fatigue Characteristic of an FPSO Flare Tower in Offshore West Africa
The Twenty-fifth International Ocean and Polar Engineering Conference·2015
A New Look on the Pauline Theology and the Juristic Act Subject to a Condition Precedent: Integration of Theology and Law
faith & scholarship·2015
Durability of Ru-based EUV masks and the improvement
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2014· 2 cited
Chemical Improvement of Euv Ruthenium Capping Layer Against Active Oxygen and Hydroxyl Radicals
ECS Meeting Abstracts·2013Open Access
Deflector contamination in E-beam mask writer and its effect on pattern placement error of photomask for sub 20nm device node
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2012· 1 cited
Impact of mask line edge roughness and statistical noise on next generation mask making
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2012· 2 cited
The requirements for the future e-beam mask writer: statistical analysis of pattern accuracy
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2011· 7 cited
Mask writing time explosion and its effect on CD control in e-beam lithography
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2010· 13 cited
Requirements of e-beam size and position accuracy for photomask of sub-32 nm HP device
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2010· 3 cited
E-beam shot count estimation at 32 nm HP and beyond
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2009· 9 cited
Resist charging effect in photomask: Its impact on pattern placement error and critical dimension
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena·2008· 2 cited
Image placement error of photomask due to pattern loading effect: analysis and correction technique for sub-45 nm node
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2008· 4 cited
Requirements of photomask registration for the 45nm node and beyond: Is it possible?
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2007· 1 cited
Study of mask structure for 45-nm node based on manufacturability and lithographic performance
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2007
Feasibility study of mask fabrication in double exposure technology
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2006· 2 cited
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Frequent Co-authors

Jin Choi(9), Sang Hee Lee(8), Sang-Gyun Woo(6), Han Ku Cho(6), Chan-Uk Jeon(5), Hee Bom Kim(4), Soowan Koh(4), Jaehyuck Choi(3), Keishi Tanaka(3), Nobuyuki Yoshioka(3), Keiichi Hatta(3), Masao Otaki(3), Han-Ku Cho(2), Dong-Seok Nam(2), Junyoul Choi(2), Jong Gul Doh(2), Naohisa Takayama(2), Shingo Murakami(2), Seong Jun Min(1), Jung-Jin Kim(1)