Clifford L. Henderson

Georgia Institute of Technology — United States

Engineering · Physical Sciences

29h-index3.3kcitations243works0.02yr avg
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Research Topics

Advancements in Photolithography Techniques(111), Nanofabrication and Lithography Techniques(66), Block Copolymer Self-Assembly(42), Semiconductor materials and devices(30), Integrated Circuits and Semiconductor Failure Analysis(29)

Publications243 total

Block copolymer directed self-assembly defect modes induced by localized errors in chemoepitaxial guiding underlayers: A molecular simulation study
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena·2020· 4 cited
Understanding and mitigating bridge defects in block copolymer directed self-assembly through computational materials design and optimization
2020· 3 cited
Block copolymer line roughness and annealing kinetics as a function of chain stiffness
2019
Mitigation of line edge roughness and line width roughness in block copolymer directed self-assembly through polymer composition molecular weight manipulation
2019
Synthesis and self-assembly of high-χ poly(4-tertbutylstyrene)-block-poly(2-hydroxyethylmethacrylate)
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena·2019· 5 cited
Structural effects on the performance of epoxide-based negative-tone molecular resists
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena·2019· 4 cited
Phenol-functionalized polymerization control additives for negative tone epoxide crosslinking molecular resists
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena·2018
Effect of homopolymer concentration on LER and LWR in block copolymer/homopolymer blends
2018· 3 cited
Protracted Colored Noise Dynamics Applied to Linear Polymer Systems
Macromolecular Theory and Simulations·2018· 5 cited
Synthesis and Characterization of New Block Copolymers for Direct Self-assembly
Advanced Functional Materials·2018· 1 cited
Chemoepitaxial guiding underlayers for density asymmetric and energetically asymmetric diblock copolymers
Journal of Micro/Nanolithography MEMS and MOEMS·2017· 1 cited
Positive-tone crosslinked molecular resist based on acid-catalyzed depolymerization
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena·2017· 3 cited
Crosslinkable photoacid generators for ultrahigh loading in epoxide functionalized molecular resists
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena·2017· 2 cited
Effect of chemoepitaxial guiding underlayer design on the pattern quality and shape of aligned lamellae for fabrication of line-space patterns
Journal of Micro/Nanolithography MEMS and MOEMS·2017· 2 cited
Free energy of defects in chemoepitaxial block copolymer directed self-assembly: effect of pattern density and defect position
Journal of Micro/Nanolithography MEMS and MOEMS·2017· 2 cited
Synthesis and self-assembly of low χ block copolymers with large periodicity
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena·2017
Block copolymer directed self-assembly using chemoepitaxial guiding underlayers with topography
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena·2017· 2 cited
Free energy of defects in chemoepitaxial block copolymer directed self-assembly: effect of pattern density and defect position
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2017· 2 cited
Calculations of the free energy of dislocation defects in lamellae forming diblock copolymers using thermodynamic integration
Journal of Micro/Nanolithography MEMS and MOEMS·2016· 9 cited
Chemoepitaxial guiding underlayers for density asymmetric and energetically asymmetric diblock copolymers
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE·2016
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Frequent Co-authors

Richard A. Lawson(13), Laren M. Tolbert(12), Cheng-Tsung Lee(9), Wang Yueh(8), Jose Baltazar(7), Samuel Graham(6), Peter J. Ludovice(5), Hossein Sojoudi(5), Kenneth E. Gonsalves(5), A. K. Sinha(4), Dennis W. Hess(4), Seth R. Marder(4), H.A. Reed(3), Sue Ann Bidstrup Allen(3), Paul A. Kohl(3), Victor Breedveld(3), Larry F. Rhodes(3), Sergio A. Paniagua(3), J. M. Roberts(3), William P. King(3)