Sebastian Engelmann

Engineering · Physical Sciences

28h-index2.8kcitations129works0.02yr avg
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Research Topics

Semiconductor materials and devices(69), Plasma Diagnostics and Applications(33), Photonic and Optical Devices(29), Advancements in Semiconductor Devices and Circuit Design(21), Semiconductor Lasers and Optical Devices(19)

Publications129 total

Low-noise amplifier cryogenic testbed validation in a TaaS (Testing-as-a-Service) framework
arXiv (Cornell University)·2023Open Access
The 2021 release of the Quantemol database (QDB) of plasma chemistries and reactions
Plasma Sources Science and Technology·2022· 28 citedOpen Access
Etch and patterning development for 2nm node nanosheet devices
2022· 1 cited
Control of sidewall roughness formation in through-silicon via etch at non-cryogenic temperatures
2022· 2 cited
Study of surface interactions for encapsulation of phase change memory materials
2022
Photonic metacrystal: design methodology and experimental characterization
Optics Express·2022· 7 citedOpen Access
Photonic Metacrystal: Design and Experimental Results
Conference on Lasers and Electro-Optics·2022
Plasma processing for advanced microelectronics beyond CMOS
Journal of Applied Physics·2021· 31 citedOpen Access
Resistive Memory Process Optimization for High Resistance Switching Toward Scalable Analog Compute Technology for Deep Learning
IEEE Electron Device Letters·2021· 7 cited
Etching with electron beam-generated plasmas: Selectivity versus ion energy in silicon-based films
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films·2021· 22 citedOpen Access
Effect of surface temperature on GeSbTe damage formation during plasma processing
2021· 2 cited
Process trace analytics for process development
2021
Plasma Ion Doping for Semiconductor Applications
Bulletin of the American Physical Society·2020
Plasma Enhanced Atomic Layer Etch/Atomic Layer Deposition
Bulletin of the American Physical Society·2020
Atomic Precision Processing of New Materials for Frontier\n Microelectronic Applications in High Performance Computing and Artificial\n Intelligence
arXiv (Cornell University)·2020Open Access
Atomic Precision Processing of New Materials for Frontier Microelectronic Applications in High Performance Computing and Artificial Intelligence
arXiv (Cornell University)·2020Open Access
Significance of plasma-photoresist interactions for atomic layer etching processes with extreme ultraviolet photoresist
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films·2020· 7 cited
Utilizing photosensitive polymers to evaluate UV radiation exposures in different plasma chamber configurations
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films·2020· 6 cited
Hydrocarbon layer formation and removal studies on SiN films etched in halogen/hydrofluorocarbon plasmas
2020· 1 cited
Selective atomic layer etching of HfO2 over silicon by precursor and substrate-dependent selective deposition
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films·2020· 23 cited
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Frequent Co-authors

Robert L. Bruce(26), G. S. Oehrlein(20), Eric Joseph(15), Tymon Barwicz(13), Swetha Kamlapurkar(11), Paul Fortier(10), D. Nest(10), David B. Graves(10), Nicolas Boyer(9), Alexander Janta-Polczynski(9), Hiroyuki Miyazoe(8), F. Weilnboeck(8), Dominik Metzler(7), Cecily Andes(7), Eric A. Hudson(7), R. J. Phaneuf(7), Marwan Khater(6), Taesoon Kwon(6), Michael Guillorn(5), Chen Li(5)