W. G. J. N. Valkenburg

Philips (Netherlands) — Netherlands

Engineering · Physical Sciences

4h-index442citations4works0.02yr avg
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Research Topics

Metal and Thin Film Mechanics(2), Semiconductor materials and devices(2), Silicon and Solar Cell Technologies(2), Diamond and Carbon-based Materials Research(1), Thin-Film Transistor Technologies(1)

Publications4 total

Influence of Deposition Temperature, Gas Pressure, Gas Phase Composition, and RF Frequency on Composition and Mechanical Stress of Plasma Silicon Nitride Layers
Journal of The Electrochemical Society·1985· 190 cited
Characterization of Plasma Silicon Nitride Layers
Journal of The Electrochemical Society·1983· 152 cited
The deposition of silicon from silane in a low-pressure hot-wall system
Journal of Crystal Growth·1982· 75 cited
Rate-determining reactions and surface species in CVD silicon
Journal of Crystal Growth·1982· 25 cited

Frequent Co-authors

W. A. P. Claassen(4), J. Bloem(2), M. F. C. Willemsen(1), W. M. van de Wijgert(1), F.H.P.M. Habraken(1), Y. Tamminga(1), C.H.J. Van Den Brekel(1)